Advances in nozzle architecture design, driven by Silicon MEMS capabilities and freedoms, to deliver next generation inkjet printheads
Leveraging over 30 years of printhead design, Fujifilm Dimatix continue to push the boundaries of what can be done with the technology and processes to enable piezo inkjet technology to leap forward in capabilities and performance to address the ever increased demands from the market.
Leading the evolution of Silicon MEMS printhead development, at their in-house wafer-fab facility in Santa Clara, California, over the last 10 years Fujifilm Dimatix has delivered meaningful innovation in the technology with:
- Sputtered PZT; to deliver exceptional nozzle life and performance stability over time
- Nozzle level Ink recirculation; leading to increased reliability and sustainability
- Structurally hard and robust nozzle plates; for increased resilience from head strikes
- Durable non-wetting nozzle plate coatings; for exceptional drop ejection behavior and improved sustainability
- Robust, chemically inert material sets; eliminating adhesive layers within the nozzle plate structure to produce a highly stable, uniform and robust monolithic structure.
Fujifilm Dimatix will use this presentation to outline how, with the development of proprietary modeling tools and utilizing the flexibility of the MEMS manufacturing processes, has enabled Dimatix to evolve their designs to manufacture highly desirable nozzle geometries, delivering higher jet speeds, flatter frequency responses and more stable long life performance.